Spatial light modulator and method
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United States of America Patent
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-
Jan 28, 1986
Grant Date -
N/A
app pub date -
Jul 31, 1984
filing date -
Jul 31, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Methods of fabrication of spatial light modulators with deflectable beams by plasma etching after dicing of a substrate into chips, each of the chips an SLM, is disclosed. Also, various architectures available with such plasma etching process are disclosed and include metal cloverleafs for substrate addressing, metal flaps formed in a reflecting layer over a photoresist spacer layer, and torsion hinged flaps in a reflecting layer.
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