Lateral insertion method for spinous process spacer with deployable member
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United States of America Patent
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-
Apr 5, 2011
Grant Date -
Oct 13, 2005
app pub date -
Feb 28, 2005
filing date -
Jan 2, 1997
priority date (Note) -
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status (Latency Note)
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Abstract
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a deployable second arm that converts between a first position for insertion and a second position for retention of the implant between adjacent spinous processes. A tool can be used to insert the spine distraction implant.
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