METHOD FOR CONTROLLING POLISHING FLUID DISTRIBUTION
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United States of America Patent
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app pub date -
Jul 11, 2006
filing date -
Apr 22, 2002
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Abandoned
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Abstract
A method for delivering a polishing fluid to a chemical mechanical polishing surface is provided. In one embodiment, a method for delivering a polishing fluid to a polishing surface of a chemical mechanical polisher includes flowing polishing fluid to a first portion of the polishing surface through a first outlet while a second portion of the polishing surface adjacent a second outlet receives no flow of polishing fluid, and flowing polishing fluid through the second outlet to the second portion of the polishing surface.
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