Method and apparatus for face recognition using extended gabor wavelet features

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United States of America Patent

APP PUB NO 20080107311A1
SERIAL NO

11797886

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A face recognition method and apparatus using extended Gabor wavelet features are provided. In the face recognition method, extended Gabor wavelet features are extracted from a face image by applying an extended Gabor wavelet filter, a Gabor wavelet feature set is selected by performing a supervised learning process on the extended Gabor wavelet features, and the selected Gabor wavelet feature set is used for face recognition. Accordingly, it is possible to solve problems of a high error rate of face recognition and low face recognition efficiency caused from a limitation of parameters of the Gabor wavelet filter. In addition, it is possible to solve the problem of increased calculation complexity caused from using an extended Gabor wavelet filter and to implement robust face recognition which is excellent in dealing with a change in expression and illumination.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO ROAD SOUTH KOREA SAMSUNG SUWON CITY LINGTONG DISTRICT NO 129 SUWON GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Xiangsheng Yongin-si, KR 7 144
Hwang, Won-jun Seoul, KR 20 517
Kee, Seok-chaol Seoul, KR 1 22
Lee, Jong-ho Hwaesong-si, KR 219 3511
Moon, Young-su Seoul, KR 51 581
Park, Gyu-lee Anyang-si, KR 1 22

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