US Patent Application No: 2012/0048,830

Number of patents in Portfolio can not be more than 2000

Abrasive Liquid For Metal and Method for Polishing

ALSO PUBLISHED AS: 8491807

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Abstract

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An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
HITACHI CHEMICAL COMPANY, LTD.TOKYO696
RENESAS ELECTRONICS CORPORATIONTOKYO12838

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshio Kokubunji, JP 20 123
Hoshino, Tetsuya Tokyo, JP 37 127
Kamigata, Yasuo Ibaraki, JP 41 167
Kondoh, Seiichi Kokubunji, JP 13 50
Matsuzawa, Jun Ibaraki-ken, JP 34 192
Terazaki, Hiroki Tsukuba, JP 38 177
Uchida, Takeshi Ibaraki, JP 107 345

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