US Patent Application No: 2012/0048,830

Number of patents in Portfolio can not be more than 2000

Abrasive Liquid For Metal and Method for Polishing

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Abstract

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An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
HITACHI CHEMICAL COMPANY, LTD.TOKYO752
RENESAS ELECTRONICS CORPORATIONTOKYO12682

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshio Kokubunji, JP 14 132
Hoshino, Tetsuya Tsukuba, JP 24 140
Kamigata, Yasuo Tsukuba, JP 33 186
Kondoh, Seiichi Kokubunji, JP 8 53
Matsuzawa, Jun Hitachi, JP 23 227
Terazaki, Hiroki Tsukuba, JP 24 209
Uchida, Takeshi Tsukuba, JP 87 414

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