US Patent Application No: 2012/0048,830

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Abrasive Liquid For Metal and Method for Polishing

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ALSO PUBLISHED AS: 8491807
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Abstract

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An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
HITACHI CHEMICAL COMPANY, LTD.TOKYO1161
RENESAS ELECTRONICS CORPORATIONTOKYO14173

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshio Kokubunji, JP 19 109
Hoshino, Tetsuya Tokyo, JP 36 105
Kamigata, Yasuo Ibaraki, JP 40 136
Kondoh, Seiichi Kokubunji, JP 12 38
Matsuzawa, Jun Ibaraki-ken, JP 34 178
Terazaki, Hiroki Tsukuba, JP 37 158
Uchida, Takeshi Ibaraki, JP 99 300

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