US Patent Application No: 2012/0048,830

Number of patents in Portfolio can not be more than 2000

Abrasive Liquid For Metal and Method for Polishing

ALSO PUBLISHED AS: 8491807

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Abstract

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An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
HITACHI CHEMICAL COMPANY, LTD.TOKYO700
RENESAS ELECTRONICS CORPORATIONTOKYO12808

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Yoshio Kokubunji, JP 20 125
Hoshino, Tetsuya Tokyo, JP 37 130
Kamigata, Yasuo Ibaraki, JP 41 169
Kondoh, Seiichi Kokubunji, JP 13 51
Matsuzawa, Jun Ibaraki-ken, JP 34 194
Terazaki, Hiroki Tsukuba, JP 38 179
Uchida, Takeshi Ibaraki, JP 110 351

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