CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SEMICONDUCTOR SUBSTRATES
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United States of America Patent
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Oct 5, 2017
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Oct 6, 2016
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Abstract
This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 3) at least one metal-containing additive; and 4) water.
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