Utilizing atomic layer deposition for programmable device
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United States of America Patent
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Jan 28, 2003
Grant Date -
Jan 2, 2003
app pub date -
Jun 30, 2001
filing date -
Jun 30, 2001
priority date (Note) -
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Abstract
In an aspect, an apparatus is provided that sets and reprograms the state of programmable devices. In an aspect, a method is provided such that an opening is formed through a dielectric exposing a contact, the contact formed on a substrate. An electrode is conformally deposited on a wall of the dielectric, utilizing atomic layer deposition (ALD). A programmable material is formed on the electrode and a conductor is formed to the programmable material. In an aspect, a barrier is conformally deposited utilizing ALD, between the electrode and the programmable material.
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