Methods of forming uniform and pitch independent fin recess

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United States of America Patent

PATENT NO 9875939
SERIAL NO

15373129

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Abstract

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Methods of fabricating integrated circuit devices for forming uniform and well controlled fin recesses are disclosed. One method includes, for instance: obtaining an intermediate semiconductor structure having a substrate, at least one fin disposed on the substrate, at least one gate structure positioned over the at least one fin, and at least one oxide layer disposed on the substrate and about the at least one fin and the at least one gate structure; implanting germanium (Ge) in a first region of the at least one fin; and removing the first region of the at least one fin implanted with Ge.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jain, Sameer Hopewell Junction, US 3 18
Ke, Yue Arlington, US 24 175
Moser, Benjamin Malta, US 5 10
Reznicek, Alexander Troy, US 1408 11211
Schepis, Dominic J Wappingers Falls, US 148 2895
Smith, Melissa A Cambridge, US 16 41
Utomo, Henry K Newburgh, US 70 1389
Vega, Reinaldo Mahopac, US 93 284

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