Process for forming photoresist images
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United States of America Patent
Stats
-
Jul 9, 1985
Grant Date -
N/A
app pub date -
Apr 12, 1983
filing date -
Apr 13, 1982
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for forming photoresist images by sticking photosensitive layer formed on a film of a polyvinyl alcohol resin which is not soluble in water, but is swellable with water, to a substrate, exposing the photosensitive layer to light through the polyvinyl alcohol resin film, washing away the polyvinyl alcohol resin film with water and developing the photosensitive layer with a developer.
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Cited Art Landscape
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