Tapered cell profile and fabrication

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United States of America Patent

PATENT NO 10847719
SERIAL NO

16877154

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Abstract

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Methods, systems, and devices for a tapered cell profile and fabrication are described. A memory storage component may contain multiple chalcogenide materials and may include a tapered profile. For example, a first chalcogenide material may be coupled with a second chalcogenide material. Each of the chalcogenide materials may be further coupled with a conductive material (e.g., an electrode). Through an etching process, the chalcogenide materials may tapered (e.g., step tapered). A pulse may be applied to the tapered chalcogenide materials resulting in a memory storage component that includes a mixture of the chalcogenide materials.

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Patent Owner(s)

  • MICRON TECHNOLOGY INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Conti, Anna Maria Milan, IT 44 99
Pirovano, Agostino Milan, IT 143 1180
Redaelli, Andrea Casatenovo, IT 153 1036

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