System and method of smoothing mask shapes for improved placement of sub-resolution assist features
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United States of America Patent
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Aug 28, 2007
Grant Date -
Jul 14, 2005
app pub date -
Jan 12, 2004
filing date -
Jan 12, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method is disclosed for providing associated shapes of an optical lithography mask in relation to predetermined main shapes of the mask. The method includes generating simplified layout patterns from the predetermined main shapes of the mask. Such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information. The associated shapes are then generated relative to the simplified mask patterns.
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